2-head magnetron DC sputtering multi metal coating machine

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2-head magnetron DC sputtering multi metal coating machine
Posting date : Jul 17, 2020
Free Member Scince Jul 13, 2020
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Keyword :
jibin wang
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Company Info
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Place of Origin
China [CN]
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Package & Delivery Lead Time
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Delivery Lead Time
30 days
Detailed Description

Dual-target DC magnetron sputtering coating CY-MSP300S-2DC

Dual-target DC magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable.
  • There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated. 
  • The device is equipped with two 500W DC power supply. The DC power supply can be used for the preparation of metal film. The two targets can meet the needs of multi-layer or multiple coatings.
  • The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements.
  • The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency.
  • This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.


Dual-target DC magnetron sputtering coating application:

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.


Dual-target DC magnetron sputtering coating technical parameters:

Sample stage
Temperature control accuracy:±1℃
Heating temperature:Max 500℃
Rotate speed:1-20rpm adjustable
Magnetron Sputtering   target head
Quantity:2”×2 (1”,2” optional)
Water chiller:Circulating water chiller   with flow rate of 10L/min
Cooling mode:Water cooling
Vacuum chamber
Chamber size:φ300mm×300mm
Watch window:φ100mm
Chamber material:Stainless steel
Opening mode:Top cover open
Mass flowmeter
2 channels; measuring   range 100SCCM; 100SCCM (can be customized according to customer needs)
Vacuum system
Pumping interface:KF40
Molecular pump:CY-600
Exhaust interface:KF16
Backing pump:rotary vane pump
Vacuum measurement:Compound vacuum gauge
Ultimate vacuum:1.0E-5Pa
Power supply:AC;220V 50/60Hz
Pumping rate:Molecular pump: 600L/S rotary vane pump: 1.1L/S  
Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes
Power configuration
DC power supply×2;Max output power:DC 500W
Other parameters
Supply voltage:AC220V,50Hz
Overall size:600mm×650mm×1280mm
Total power:2.5KW
Total Weight:About 300kg

ECROBOT CO., Ltd, Business Registration Number : 220-88-71747, CEO Park Jae Woo, TEL : +82-2-552-7676, E-mail : info@ecrobot.com
Address : (Hwanghwa B/D 11F, Yeoksam-dong)320, Gangnam-daero, Gangnam-gu, Seoul, South Korea
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