desktop one-target DC magnetron sputter vacuum pvd metallic coater

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desktop one-target DC magnetron sputter vacuum pvd metallic coater
Posting date : Jul 17, 2020
Free Member Scince Jul 13, 2020
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wooden box packaging
Keyword :
jibin wang
Product Detail
Company Info
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Place of Origin
China [CN]
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Model Number
Package & Delivery Lead Time
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Delivery Lead Time
30 days
Detailed Description

Small desktop single-target DC magnetron sputtering coater CY-MSP180G-DC


  1. a cost-effective magnetron sputtering coating equipment independently developed by our company. It has the characteristics of miniaturization and standardization.
  2. The magnetron target head has 1 inch and 2 inches to choose from. Customers can choose the target according to the size of the substrate to be plated.
  3. The device is equipped with 150W DC power supply, which can be used for metal sputter coating.
  4. The coating machine is equipped with gas inlet port for the introduction of protective gas. If the customer needs the mixed gases, the staff can be contacted to configure the high-precision mass flow meter to meet the experimental needs.
  5. The instrument is equipped with advanced turbomolecular pump set, the ultimate vacuum is up to 1.0E-5pa, and other types of molecular pumps are also available.


Application:vacuum pvd metallic coater

The device can be used to prepare single-layer ferroelectric thin films, conductive films, alloy films, and so on. Compared with similar equipment, the single-target magnetron sputtering coater is compact, highly integrated and small in size, and can be placed on a desktop. It is an ideal equipment for laboratory preparation of material films.

Technical parameters:vacuum pvd metallic coater

Sample stage


Temperature control accuracy:±1℃

Heating temperature:Max 500℃

Rotate speed:1-20rpm adjustable

Magnetron Sputtering target head

2-inch×1 (1-inch,2-inch optional)

Circulating water chiller with flow rate of 10L/min

Vacuum chamber

Chamber size:φ180mm×215mm

Watch window:Omnidirectional transparent

Chamber material:High purity quartz

Opening mode:Top cover removable

Vacuum system


Pumping interface:KF40

Molecular pump:CY-600

Exhaust interface:KF16

Backing pump:rotary vane pump

Vacuum measurement:Compound vacuum gauge

Ultimate vacuum:1.0E-5Pa

Power supply:AC;220V 50/60Hz

Pumping rate:Molecular pump: 600L/S    rotary vane pump: 1.1L/S 

Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes

Power configuration

DC power supply x1;Max output power 150W

Other parameters

Supply voltage:AC220V,50Hz

Overall size:500mm×350mm×400mm

Total power:1.7KW (Vacuum pump1.5KW+machine0.2KW)

Total Weight:About 30kg


ECROBOT CO., Ltd, Business Registration Number : 220-88-71747, CEO Park Jae Woo, TEL : +82-2-552-7676, E-mail :
Address : (Hwanghwa B/D 11F, Yeoksam-dong)320, Gangnam-daero, Gangnam-gu, Seoul, South Korea
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