The device can be used to prepare single-layer ferroelectric thin films, conductive films, alloy films, and so on. Compared with similar equipment, the single-target magnetron sputtering coater is compact, highly integrated and small in size, and can be placed on a desktop. It is an ideal equipment for laboratory preparation of material films.
Sample stage |
Size:φ138mm Temperature control accuracy:±1℃ Heating temperature:Max 500℃ Rotate speed:1-20rpm adjustable |
Magnetron Sputtering target head |
2-inch×1 (1-inch,2-inch optional) Circulating water chiller with flow rate of 10L/min |
Vacuum chamber |
Chamber size:φ180mm×215mm Watch window:Omnidirectional transparent Chamber material:High purity quartz Opening mode:Top cover removable |
Vacuum system |
Model:CY-GZK103-A Pumping interface:KF40 Molecular pump:CY-600 Exhaust interface:KF16 Backing pump:rotary vane pump Vacuum measurement:Compound vacuum gauge Ultimate vacuum:1.0E-5Pa Power supply:AC;220V 50/60Hz Pumping rate:Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes |
Power configuration |
DC power supply x1;Max output power 150W |
Other parameters |
Supply voltage:AC220V,50Hz Overall size:500mm×350mm×400mm Total power:1.7KW (Vacuum pump1.5KW+machine0.2KW) Total Weight:About 30kg |