one-head dc magnetron sputtering deposition metal coating machine

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one-head dc magnetron sputtering deposition metal coating machine
Posting date : Jul 17, 2020
Free Member Scince Jul 13, 2020
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jibin wang
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Place of Origin
China [CN]
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Delivery Lead Time
30 days
Detailed Description

Single target DC magnetron sputtering coater CY-MSP300S-DC

Single target DC magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. The magnetron target head can be selected from 1 inch 2 inches 3 inches. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with 1500W high power DC power supply, which can be used for high energy metal sputter coating. Other specifications of DC or RF power supply can be selected to achieve coating operation of various materials.


The coating machine has a two-channel high precision mass flow meter. If customers have other requirements, the gas path of up to four-channel mass flow meter can be customized to meet the complex gas environment requirements. The instrument is equipped with advanced turbo molecular pump group, and ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Single target DC magnetron sputtering coater application:

This device can be used for preparing single-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the single target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

Single target DC magnetron sputtering coater technical parameters:

Sample stage


Temperature   control accuracy:±1℃

Heating temperature:Max 500℃

Rotate speed:1-20rpm adjustable

Magnetron Sputtering target head

2”×1 (1”,2”,3”, 4”optional)

Circulating water chiller with flow rate of 10L/min

Vacuum chamber

Chamber size:φ300mm×300mm

Watch window:φ100mm

Chamber material:Stainless steel

Opening mode:Top cover open

Mass flowmeter

2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs)

Vacuum system


Pumping interface:KF40

Molecular pump:CY-600

Exhaust interface:KF16

Backing pump:rotary vane pump

Vacuum measurement:Compound vacuum gauge

Ultimate vacuum:1.0E-5Pa

Power supply:AC;220V 50/60Hz

Pumping rate:Molecular pump: 600L/S    rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20   minutes

Power   configuration

DC power supply×1;Max output power:1500W

Other   parameters

Supply   voltage:AC220V,50Hz

Overall  size:600mm×650mm×1280mm

Total power:3KW

Total Weight:300kg


ECROBOT CO., Ltd, Business Registration Number : 220-88-71747, CEO Park Jae Woo, TEL : +82-2-552-7676, E-mail :
Address : (Hwanghwa B/D 11F, Yeoksam-dong)320, Gangnam-daero, Gangnam-gu, Seoul, South Korea
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