Multi - Arc Ion Vacuum Coating Machine / Vacuum Metalizing Equipment For Hardware

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Product
Multi - Arc Ion Vacuum Coating Machine / Vacuum Metalizing Equipment F...
Posting date : Oct 20, 2017
Membership
Free Member Scince Oct 09, 2017
FOB Price
By negotiation
Port
Jiangsu, China (Mainland)
Package
In film
Keyword :
Category
Contact
Tina
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Product Detail
Company Info
 
Quick Detail
Place of Origin
China [CN]
Brand Name
ATOP
Model Number
ATZK
HS-CODE
85-
Package & Delivery Lead Time
Package
In film
Delivery Lead Time
60working days
Detailed Description
ATOP Magnetron Sputtering Multi-arc Ion Vacuum Coating Machine For Hardware Main Feature 1. High deposition rate, High coating speed, It can be widely used to do the decorative coating, functional coating on a variety of products. So it is a ideal equipment to do the high-grade and best coating for mass production. 2. Magnetron sputtering principle is based on the theory of the cathode glow discharge, it expend the cathode surface magnetic field near the work piece surface. Then it improves the sputtered atom ionization rate. It keeps the magnetron sputtering uniformity, also can improve the surface shining effect. 3. The arc plasma evaporation source is reliable, it can work under 40A current in optimizing the cathode and the magnetic field structure,. It will happen atomic diffusion between the coating and the material. It also has the advantages that lon Beam Assisted Deposition. 4. Vacuum pumping system, electric control system and complete vacuum coating system can be customized according to user requirements. - - - - Product Name | ATOP Magnetron Sputtering Multi-arc Ion Vacuum Coating Machine For Hardware | Vacuum Chamber Size | Decide according to the substrate size and output | Substrate | Hardware,glass crafts,ceramic crafts,such us watches,mobile phone metal shell,sanitaryware,mould,electronic products,crystal glass, glasses, cutlery, knives and so on | Coating Film | High-grade decorative coating. | Coating Color | Gold, rose gold,coffee,brown,bronze,blue,black,white,gray etc. | Applications | Hardware,glass crafts,ceramic crafts such us watches,mobile phone metal shell,sanitary ware,mould,electronic products,crystal glass, glasses, cutlery, knives and so on. | Structure | Vertical type ; horizontal type ; single door type ; double-door type. | Coating Material | Stainless steel, aluminum, titanium, tungsten and other metal films may be manufactured as coated TIN, TIC, TICN, TIALN, CRN, CU, AU, diamond film (DLC), decorative film metal, film and non-metallic composite coating film and its compounds film. | Features | High pumping speed, high efficiency, energy saving, full automatic process controller can be simple, reliable, beautiful. | - - - - Application Field It applies to hardware,glass crafts,ceramic crafts,such us watches,mobile phone metal shell,sanitary ware,mould,electronic products,crystal glass, glasses, cutlery, knives and so on. You can make super-hard wear-resistant film coating, anti-corrosion film, decorative film(gold color,rose gold,coffee,brown,bronze,blue,black,white,gray and other colors),it combined with magnetron sputtering technique can be plated the multilayer composite membrane and manufactured plated stainless steel, aluminum, titanium, tungsten and other metal films may be manufactured as coated TIN, TIC, TICN, TIALN, CRN, CU, AU, diamond film (DLC), decorative film metal, film and non-metallic composite coating film and its compounds film. Working Principle Vacuum magnetron sputtering coating machine working principle:the so-called "splash", the electrons in an electric field under the action of accelerating the process of flying to the substrate with argon atom collision, ionization out large amounts of argon ions and electrons.The electron flies toward the substrate, the argon ion speeds up the target material under the action of the electric field, sputtering out a large number of target atom, and the neutral target atom (or molecule) is deposited on the substrate to form the film.Secondary electron in accelerating to fly to the substrate by magnetic field in the process of lorentz magnetic force, the influence of confined area near the target surface plasma, the plasma density in the area is very high, secondary electron under the action of magnetic field around the target surface is circular motion, the electron motion path is very long, constantly in the process of movement of the impact ionization out large amounts of argon ion bombardment of target, after many times of collision of the electron energy gradually reduce, cast off the yoke of the magnetic field lines, away from the target material, the final deposition on the substrate. Coating Samples

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