high purity 99.95 Ruthenium Ru sputtering target

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high purity 99.95 Ruthenium Ru sputtering target
Posting date : May 20, 2014
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81-
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Ru target (Mat-cn) Physical properties Color silver Density 12.37g/m³ Melting point 2250 Technical indicators purity 99.95% Relative density >99% Cut surface flatness 3.2Ra Tolerance ±0.1mm grain size uniform Material Ru Brand MAT-CN Origin Nanchang Jiangxi Specifications Size 01: diameter 1 mm (wafer / round table / rod) Size 02: length 1mm (rectangular / sheet / splicing) Size 03: outer diameter 1mm length> 1 mm (pipe / ring / rotatable targets) Size 04:be customized according to user needs, sample processing, to map processing Minimum order quantity 1 piece, large concessions Supply capacity the same batch, the same material, continuous and reliable supply; 100 kg / month min Delivery time 2-3weeks after payment,excluding special material Production process vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining Applicable instruments various models magnetron sputtering equipment, etc. Product uses industrial-grade coating, experiments or research level Ru target, electronics, optoelectronics, military, decorative, functional film Advantages quality 1. reasonable price and good quality 2. high purity, less impurities 3.Dense, rolling, oxidation, forming plasticizers 4.relatively high density, grain uniformity axis, consistency Product accessories formal quotation / purchase and sales contracts / packing list / material analysis detection of single / formal invoice Packing vacuum packaging / vacuum neutral packing / special packaging outside reinforcement packag Mode of transport for UPS, DHL or FedEx or Ship(FOB/CIF)

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