2014 high-purity ITO sputtering target

본문 바로가기


Home > Product > 2014 high-purity ITO sputtering target
Product
2014 high-purity ITO sputtering target
Posting date : Apr 30, 2014
Membership
Free Member Scince Apr 30, 2014
Keyword :
Category
Contact
          0 likes     
Product Detail
Company Info
 
Quick Detail
Place of Origin
HS-CODE
27-
Package & Delivery Lead Time
Detailed Description
•Item name: high purity ITO target high purity ITO sputtering target(In2O3:SnO2=90:10(wt%)) •Purity:99.99% •Shape: square/round, according to your request •Available size: round: dia 25~300mm, thickness:3~10mm •Rectangular: length up to 1500mm •Customization is available •Certificates:ISO9001:2008, SGS, The third test report •Technics: hot Isostatic pressing •Application: ◦Widely used in coating processing industries ◦Solar photovolatic application. ◦Electronic and Semiconductor Application ◦Decoration and Coating Application. etc. ◦High purity ITO sputtering target, tungsten electrodes for welding

ECROBOT CO., Ltd, Business Registration Number : 220-88-71747, CEO J.W.Park, TEL : +82-2-552-7676, E-mail : E-mail : Contact us
Address : (Hwanghwa B/D 11F, Yeoksam-dong)320, Gangnam-daero, Gangnam-gu, Seoul, South Korea
About Us Privacy Policy Terms of use Copyright © 2000-2024 ECROBOT.COM. All rights reserved.
Top