AlN sputtering target(MAT-CN)

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AlN target 99.99% Physical properties Color white Density _ Melting point _ Technical indicators purity 99.99% Relative density >99% Cut surface flatness 3.2Ra Tolerance ±0.1mm grain size uniform Material AlN Brand MAT-CN Origin Nanchang Jiangxi Specifications Size 01: diameter <360mm thickness> 1 mm (wafer / round table / rod) Size 02: length <300mm width <300mm thickness> 1mm rectangular / sheet / step-like (splicing) Size 03: outer diameter <360mm inner diameter> 1mm wall degree> 1 mm length> 1 mm (pipe / ring / rotatable targets) Size 04 :: be customized according to user needs, sample processing, to map processing Minimum order quantity 1, large concessions Supply capacity the same batch, the same material, continuous and reliable supply; 100 kg / month min Delivery time a single sheet of material 1 week delivery, bulk material 20 days -30 days delivery(working days) Production process vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining Applicable instruments various models magnetron sputtering equipment, etc. Product uses industrial-grade coating, experiments or research level AlN target, electronics, optoelectronics, military, decorative, functional film Advantages quality 1. reliability, price 2.Vacuum melting, purification and preparation of high purity, less impurity 3.Dense, rolling, oxidation, forming plasticizers 4.relatively high density, grain uniformity axis, consistency Product accessories formal quotation / purchase and sales contracts / packing list / material analysis detection of single / formal invoice Packing vacuum packaging / vacuum neutral packing / special packaging outside reinforcement package Mode of transport for domestic express carrier (SF, Shen Tong, EMS, Nadu --- safe, fast and reliable)

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China Material Technology Co,.LTD.

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