PVD dual-target RF magnetron sputtering coating machine with film thickness gauge

Product

PVD dual-target RF magnetron sputtering coating machine with film thic...

Posting date : Jul 17, 2020

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Membership

Free Member Scince Jul 13, 2020

FOB Price

26000

Min. Order Quantity

Supply Abillity

Port

qingdao,shanghai,

Payment Terms

T/T, L/C, Pay Later,Western Union,VISA

Package

wooden box packaging

Keyword :

magnetron sputtering

Dual-target RF magnetron sputtering coater with two film thickness gauges CY-MSP300S-RFDC-FG

a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable.

There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with 300W RF power supply and 500W DC power supply. The DC power supply can be used for the preparation of metal film, and the RF power supply can be used for the preparation of non-metal films. The two targets can meet the needs of multi-layer coatings. If customers have other coating needs, DC power supply and pulse power supply can be customized. Various types of power supply are available from 300W to 1000W in various specifications.

The coating machine has a two-channel high precision mass flow meter. If customers have other requirements, the gas channel of up to four-channel mass flow meter can be customized to meet the complex gas environment requirements. The instrument is equipped with advanced turbo molecular pump group, and ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase.

In addition, this machine is equipped with two high precision film thickness gauges, which can meet the film thickness detection requirements during the coating process. If customers need to install multiple film thickness gauges, also can contact our technical staff for customization.

This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Dual-target RF magnetron sputtering coater application:

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

Dual-target RF magnetron sputtering coater technical parameters:

Sample stage	Size:φ185mm Temperature control accuracy:±1℃ Heating temperature:Max 500℃ Rotate speed:1-20rpm adjustable
Magnetron Sputtering target head	Quantity:2”×2 (1”,2” optional) Water chiller:Circulating water chiller with flow rate of 10L/min
Vacuum chamber	Chamber size:φ300mm×300mm Watch window:φ100mm Chamber material:Stainless steel Opening mode:Top cover open
Mass flowmeter	2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs)
Vacuum system	Model:CY-GZK103-A Pumping interface:KF40 Molecular pump:CY-600 Exhaust interface:KF16 Backing pump:rotary vane pump Vacuum measurement:Compound vacuum gauge Ultimate vacuum:1.0E-5Pa Power supply:AC;220V 50/60Hz Pumping rate:Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes
Power configuration	RF power supply×1;Max output power:RF 300 W DC power supply×1;Max output power:RF 500 W
Other parameters	Supply voltage:AC220V,50Hz Overall size:600mm×650mm×1280mm Total power:2.5KW Total Weight:About 300kg