High purity alloy sputtering target

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High purity alloy sputtering target
Posting date : Jul 05, 2011
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Free Member Scince Jun 21, 2011
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Place of Origin
China [CN]
HS-CODE
74-
Package & Delivery Lead Time
Delivery Lead Time
2012-07-05
Detailed Description
High purity alloy sputtering target: Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Alloy target, Cu-Ga Alloy target, Cu-Im-Ga Alloy target, Cu-Im-Ga-Se Alloy target, stainless steel target, Zn-Al Alloy target,W-Ti Alloy target, Fe-Cot Alloy target, etc Note: CNM product high purity Alloy sputtering target: tiny grain size number (150-60um), high relative density (99-99.9%), high purity (99.9-99.999%). In addition, CNM provides with the metalizing process of the target materials and unbounded services.

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