High density ceramic sputtering target

본문 바로가기


Home > Product > High density ceramic sputtering target
Selling leads
High density ceramic sputtering target
Posting date : Jul 05, 2011
Membership
Free Member Scince Jun 21, 2011
Keyword :
Category
Contact
Selling Leads Detail
Company Info
 
Quick Detail
Place of Origin
China [CN]
HS-CODE
69-
Package & Delivery Lead Time
Delivery Lead Time
2012-07-05
Detailed Description
(CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel display , architectural and automotive glass, thin film solar cell, magnetic storage, instrument, decorate thin film, etc.) High density ceramic sputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3, Ni2O3, Cr2O3, ZnO, ZnS, CdS, MoS2, SiO2, SiO, ZrO2, Nb2O5, TiO2, HfO2, TiB2, ZrB2, WO3, Al2O3, Ta2O5, MgF2, ZnSe, AlN, Si3N4, BN,TiN, SiC, LINbO3, BaTiO3, LaTiO3, PrTiO3 target, etc. Note: The ceramic target produced in CNM adopts the most advanced ceramic production technology-inert gas protection hot isostatic pressing sintering technology, the relative density is grater than 95-99%. In addition, CNM could provide with the metalizing process of the target and unbounded services.

ECROBOT CO., Ltd, Business Registration Number : 220-88-71747, CEO J.W.Park, TEL : +82-2-552-7676, E-mail : E-mail : Contact us
Address : (Hwanghwa B/D 11F, Yeoksam-dong)320, Gangnam-daero, Gangnam-gu, Seoul, South Korea
About Us Privacy Policy Terms of use Copyright © 2000-2024 ECROBOT.COM. All rights reserved.
Top