Barium Titanate sputtering target(BaTiO3)

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Barium Titanate sputtering target(BaTiO3)
Posting date : Apr 11, 2012
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Free Member Scince Apr 10, 2012
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Place of Origin
China [CN]
HS-CODE
27-
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Detailed Description
Barium Titanate Sputtering target - BaTiO3 target Purity --- 99.8%,99.95% Shape --- Disk, Plate, Plate, Sheet, Rod, Taper Application - Media, TFR, Thin film capacitor Barium Titanate Evaporation Material - BaTiO3 Purity --- 99.8%,99.95% Melting point---1612 ℃ Theoretical density --- 6.06g/cm3 Shape --- 1-5mm,

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